Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California | 東京工業大学附属図書館蔵書検索

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Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

資料種別:

図書

出版情報:

Bellingham, Wash., USA : SPIE, c1989

形態:

viii, 388 p. ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 1089 <BA0022700X>

著者名:

ISBN:

9780819401243 [0819401242]

書誌ID:

BA12683130

子書誌情報

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書誌詳細

注記:	Proceedings of the SPIE Symposium on Microlithography Includes bibliographical references
主題:	Ion beam lithography--Congresses; Lithography, Electron beam--Congresses; X-ray lithography--Congresses
言語:	英語

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