- Society of Photo-optical Instrumentation Engineers (60)
- BACUS (Technical group) (16)
- Photomask Japan (9)
- SEMATECH (8)
- Behringer, Uwe F. W. (7)
- Semiconductor Equipment and Materials International (6)
- Stover, Harry L. (6)
- VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik (5)
- 応用物理学会 (5)
- European Conference on Mask Technology for Integrated Circuits and Microcomponents (4)
- Symposium on Photomask Technology and Management (4)
- Archie, Chas N. (3)
- European Mask and Lithography Conference (3)
- Flagello, Donis G. (3)
- Forschungszentrum Karlsruhe. Institute for Microstructure Technology (3)
- Grenon, Brian J. (3)
- International SEMATECH (3)
- International Society for Hybrid Microelectronics (3)
- Metrology, Inspection, and Process Control for Microlithography (3)
- Optical Microlithography (3)
- SEMIジャパン (3)
- United States. National Institute of Standards and Technology (3)
- VDE/VDI. Society Microelectronics, Micro- and Precision Engineering (GMM) (3)
- Advances in Resist Materials and Processing Technology (2)
- Behringer, Uwe (2)
- Chinese Optical Society (2)
- Friedrich, Craig (2)
- Jones, Susan K. (2)
- Kawahira, Hiroichi (2)
- Lin, Burn Jeng, 1942- (2)
- Lin, Qinghuang (2)
- Morimoto, Hiraoki (2)
- Northern California Microphotomask/Masking Working Group (2)
- Photomask Japan (Conference) (2)
- Photomask and Next-Generation Lithography Mask Technology (2)
- Pol, Victor (2)
- Postek, Michael T. (2)
- SEMATECH (Organization) (2)
- SEMI-Europe (2)
- Watanabe, Hidehiro (2)
- AZ Electronic Materials (USA) (1)
- Abboud, Frank E. (1)
- Advanced Mcrolithography Technologies (1)
- Advances in resist technology and processing (1)
- Aizaki, Naoaki (1)
- American Vacuum Society (1)
- Annual SPIE Cconference on Advances in Resist Ttechnology and Processing (1)
- Australian Optical Society (1)
- BACUS (Technical Group) (1)
- Bacus International (1)
- Batchelder, John Samuel (1)
- Burnett, David (1)
- CEA-LETI (1)
- Cuthbert, John D. (1)
- Dao, Giang T. (1)
- Dey, Jim (1)
- Ehrlich, Daniel J. (1)
- Electrochemical Society (1)
- European Conference on Mask Technology for Integrated Circuits and Microcomponents (15th : 1998 : Munich-Unterhaching, Germany) (1)
- European Conference on Mask Technology for Integrated Circuits and Microcomponents (16th : 1999 : Munich, Germany) (1)
- Fuller, Gene E. (1)
- Guo, Guang-can (1)
- Herzig, Hans Peter (1)
- Houlihan, Francis M. (1)
- Institut für Mikrostrukturtechnik (1)
- Kimura, Shiníchiro (1)
- Kley, Ernst-Bernhard (1)
- Maurer, Wilhelm (1)
- Microlithography and Metrology in Micromachining (Symposium) (1)
- National Aeronautics and Space Administration (1)
- National Natural Science Foundation of China (1)
- National Nature Science Foundation (China) (1)
- Photomask and X-ray mask technology (1)
- Progler, Christopher J. (1)
- Reynolds, James A. (1)
- Reynolds, James A., 1930- (1)
- Rohm & Haas Company (1)
- Routh, Donald E. (1)
- Ruddell, Richard L. (1)
- SPIE Conference on Metrology, Inspection, and Process Control for Microlithography (1)
- Semiconductor Equipment and Materials Institute (1)
- Semiconductor Equipment and Materials Institute. Europe (1)
- Semiconductor Equipment and Materials International. Europe (1)
- Shelden, Gilbert V. (1)
- Singh, Bhanwar (1)
- Solid State Technology (Organization) (1)
- Sturtevant, John L. (1)
- Sullivan, Neal T. (1)
- Symposium on Microlithography (1)
- Symposium on Photomask Technology (1)
- Symposium on Photomask and X-Ray Mask Technology (1)
- Tanabe, Hiroyoshi (1)
- Tsao, Jeffrey Y. (1)
- Umeda, Akira (1)
- VDE/VDI GMM. Society for Microelectronics, Micro- and Precision Engineering (1)
- Waelpoel, Jacques (1)
- Wang, Yangyuan (1)
- Yao, Jun'en (1)
- 中华人民共和国科学技术协会 (1)
- 中华人民共和国科学技术部 (1)
>次へ