Advances in resist technology and processing III : 10-11 March 1986, Santa Clara, California

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Advances in resist technology and processing III : 10-11 March 1986, Santa Clara, California / C. Grant Willson, chairman/editor

Format:

Book

Published:

Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986

Description:

vi, 346 p. ; 28 cm

Series:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 631 <BA0022700X>

Authors:

ISBN:

9780892526666 [0892526661] (pbk.)

NCID:

BA24022715

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Bibliography Details

Note:	Includes bibliographies and index
Subject:	Photoresists--Congresses
Language:	English

Tokyo Tech Book Review

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