>> Google Books
QR code for holdings

Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA / editors, Michael Liehr ... [et al.]

Format:
Book
Published:
Pittsburgh, PA : Materials Research Society, 1995
Description:
xiii, 411 p. ; 24 cm
Series:
Materials Research Society symposium proceedings ; vol. 386 <BA00013775>
Authors:
Liehr, Michael <DA09545725>  
ISBN:
9781558992894 [1558992898]
NCID:
BA26512001
Holding items in this series
Loading
Full Text
Loading contents information
Holdings
Loading availability information
Other editions or volumes

Similar Items:

長谷川, 英機(1941-), Symposium Z, Compound Semiconductor Surface Passivation and Novel Device Processing

Materials Research Society

Ehrlich, Daniel J., Higashi, Gregg S., Oprysko, Modest Michael, 1957-, Materials Research Society

Materials Research Society

Singh, Vivek K., Rieger, Michael L., Society of Photo-optical Instrumentation Engineers, SEMATECH

SPIE

Symposium on Amorphous Silicon Technology, Hack, Michael

Materials Research Society

Jones, Erin C., Jones, Kevin S., Giles, Martin D., Stolk, Peter, Matsuo, Jiro

Materials Research Society

Srolovitz, David J., Materials Research Society Symposium on the "Modeling and Simulation of Thin-Film Processing" (1995 …

Materials Research Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12