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Microlithography / Rai-Choudhury, P.

Format:: Book
Published:: Bellingham, Wash. : SPIE Optical Engineering Press
London : Institution of Electrical Engineers, c1997
Description:: viii, 768 p. ; 26 cm
Series:: IEE materials & devices series ; 12 . Handbook of microlithography, micromachining and microfabrication / P. Rai-Choudhury, editor ; v. 1 <BA07412236>
Authors:: Rai-Choudhury, P. <DA06421453>
ISBN:: 9780819423788 [0819423785] (: us)
9780852969069 [0852969066] (: uk)
NCID:: BA31844102

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Bibliography Details

Note:

"SPIE press monograph PM39"
Includes bibliographical references and index

Subject:

Microfabrication; Microlithography; Micromachining

Language:

English

Table of Contents:

Preface

Introduction / Burn J. Lin ; P. Rai-Choudhury

Optical lithography / Harry J. Levinson ; William H. Arnold1：

Electron beam lithography / Mark A. McCord ; Michael J. Rooks2：

X-ray lithography / Franco Cerrina3：

Deep-uv resist technology / Robert D. Allen ; Willard E. Conley ; Roderick R. Kunz4：

Photomask fabrication procedures and limitations / John G. Skinner ; Timothy R. Groves ; Anthony Novembre ; Hans Pfeiffer ; Rajeev Singh5：

Metrology methods in photolithography / Laurie J. Lauchlan ; Diana Nyyssonen ; Neal Sullivan6：

Optical lithography modeling / Andrew R. Neureuther ; Chris A. Mack7：

Issues in nanolithography for quantum effect device manufacture / Martin C. Peckerar ; F. Keith Perkins ; Elizabeth A. Dobisz ; Orest J. Glembocki8：

Index

Preface

Introduction / Burn J. Lin ; P. Rai-Choudhury

Optical lithography / Harry J. Levinson ; William H. Arnold1：

Electron beam lithography / Mark A. McCord ; Michael J. Rooks2：

X-ray lithography / Franco Cerrina3：

Deep-uv resist technology / Robert D. Allen ; Willard E. Conley ; Roderick R. Kunz4：

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