Optical microlithography XI : 25-27 February 1998, Santa Clara, California / Luc Van den hove chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; Cooperating organizations SEMI-Semiconductor Equipment and Materials International SEMATECH
- Format:
- Book
- Published:
- Bellingham, Wash., USA : SPIE, c1998
- Description:
- xv, 1090 p. ; 28 cm
- Series:
- Proceedings / SPIE -- the International Society for Optical Engineering ; v. 3334 <BA0022700X>
- Authors:
- ISBN:
- 9780819427793 [0819427799]
- NCID:
- BA37525413
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