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Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California / chair/editor Will Conley ; sponsored and published by SPIE--the International Society for Optical Engineering

Format:
Book
Published:
Bellingham, Wash., USA : SPIE, c1999
Description:
2v. ; 28 cm
Series:
Proceedings / SPIE -- the International Society for Optical Engineering ; v. 3678 <BA0022700X>
Authors:
ISBN:
9780819431523 [0819431524] (: set)
NCID:
BA45995999
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