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Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California / chair/editor Will Conley ; sponsored and published by SPIE--the International Society for Optical Engineering
- Format:
- Book
- Published:
- Bellingham, Wash., USA : SPIE, c1999
- Description:
- 2v. ; 28 cm
- Series:
- Proceedings / SPIE -- the International Society for Optical Engineering ; v. 3678 <BA0022700X>
- Authors:
- ISBN:
- 9780819431523 [0819431524] (: set)
- NCID:
- BA45995999
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