Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA

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Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA / Christopher J. Progler chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; Cooperating organizations SEMI-Semiconductor Equipment and Materials International SEMATECH

Format:

Book

Published:

Bellingham, Wash., USA : SPIE, c2000

Description:

2 v. ; 28 cm

Series:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 4000 <BA0022700X>

Authors:

ISBN:

9780819436184 [0819436186] (pt. 1)
9780819436184 [0819436186] (pt. 2)

NCID:

BA48017673

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Bibliography Details

Note:	Includes bibliographical references and index
Language:	English

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