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Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA / Christopher J. Progler chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; Cooperating organizations SEMI-Semiconductor Equipment and Materials International SEMATECH

Format:
Book
Published:
Bellingham, Wash., USA : SPIE, c2000
Description:
2 v. ; 28 cm
Series:
Proceedings / SPIE -- the International Society for Optical Engineering ; v. 4000 <BA0022700X>
Authors:
ISBN:
9780819436184 [0819436186] (pt. 1)
9780819436184 [0819436186] (pt. 2)
NCID:
BA48017673
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