Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA

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Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA / Elizabeth A. Dobisz, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

Format:

Book

Published:

Bellingham, Wash. : SPIE, c2000

Description:

xv, 900 p. ; 28 cm

Series:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 3997 <BA0022700X>

Authors:

ISBN:

9780819436153 [0819436151]

NCID:

BA60711204

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Bibliography Details

Note:	Includes bibliographic references and index
Subject:	Lithography, Electron beam--Congresses; Masks (Electronics)--Congresses; Microlithography--Industrial applications--Congresses; X-ray lithography--Congresses; X-rays--Industrial applications--Congresses
Language:	English

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