Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA / Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineer
- Format:
- Book
- Published:
- Bellingham, Wash. : SPIE, c2000
- Description:
- 2v. ; 28 cm
- Series:
- Proceedings / SPIE -- the International Society for Optical Engineering ; v. 3999 <BA0022700X>
- Authors:
- ISBN:
- 9780819436177 [0819436178] (SET)
- NCID:
- BA60711838
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