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Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA / Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineer

Format:
Book
Published:
Bellingham, Wash. : SPIE, c2000
Description:
2v. ; 28 cm
Series:
Proceedings / SPIE -- the International Society for Optical Engineering ; v. 3999 <BA0022700X>
Authors:
ISBN:
9780819436177 [0819436178] (SET)
NCID:
BA60711838
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