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Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA / Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

Format:
Book
Published:
Bellingham, Washington : SPIE, c2001
Description:
2 v. (xxix, 1084 p.) ; 28 cm
Series:
Proceedings / SPIE -- the International Society for Optical Engineering ; v. 4345 <BA0022700X>
Authors:
ISBN:
9780819440310 [0819440310] (: set)
NCID:
BB29368259
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