The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface

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The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface / editors, Hisham Z. Massoud, Edward H. Poindexter, C. Robert Helms

Format:

Book

Published:

Pennington, NJ : Electrochemical Society, c1996

Description:

xv, 780 p. ; 27 cm

Series:

Proceedings / [Electrochemical Society] ; v. 96-1 <BA01323290>

Authors:

ISBN:

9781566771511 [156677151X]

NCID:

BA29993030

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Bibliography Details

Note:	"Electronics Division" Includes bibliographical references and indexes
Subject:	Dielectrics--Surfaces--Congresses; Silica--Surfaces--Congresses; Silicon dioxide films--Congresses; Surface chemistry--Congresses; Surfaces (Technology)--Congresses
Language:	English

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