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1. Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
editors, H.R. Huff ... [et al.]
Published: Warrendale, PA : Materials Research Society, 1999  xvii, 615 p. ; 24 cm
Series: Materials Research Society symposium proceedings ; v. 567
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2.

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2. Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology (: set ; v. 1 ; v. 2)
editors, H.R. Huff, L. Fabry, S. Kishino ; sponsoring division, Electronics
Published: Pennington, NJ : The Electrochemical Society, c2002  2 v. (xx, 1074 p.) ; 24 cm
Series: Proceedings / [Electrochemical Society] ; v. 2002-2
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3.

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3. Semiconductor silicon 1981 : proceedings of the fourth International Symposium on Silicon Materials Science and Technology
edited by Howard R. Huff, ... [et al.]
Published: Pennington : The Electrochemical Society, c1981  xiii, 1049 p. ; 23 cm
Series: Proceedings / [Electrochemical Society] ; v.81-5
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4.

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4. Silicon materials science and technology : proceedings of the Eighth International Symposium on Silicon Materials Science and Technology (: set ; v. 1 ; v. 2)
[sponsored by Electronics Division of the Electrochemical Society, Inc.] ; editors, H.R. Huff, H. Tsuya, U. Gösele
Published: Pennington, NJ : The Electrochemical Society, c1998  2 v. (xx, 1638 p.) ; 24 cm
Series: Proceedings / [Electrochemical Society] ; v. 98-1
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