Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA | 東京科学大学図書館　蔵書検索（大岡山図書館、すずかけ台図書館）

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Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA / Elizabeth A. Dobisz, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

資料種別:

図書

出版情報:

Bellingham, Wash. : SPIE, c2000

形態:

xv, 900 p. ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 3997 <BA0022700X>

著者名:

ISBN:

9780819436153 [0819436151]

書誌ID:

BA60711204

子書誌情報

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書誌詳細

注記:	Includes bibliographic references and index
主題:	Lithography, Electron beam--Congresses; Masks (Electronics)--Congresses; Microlithography--Industrial applications--Congresses; X-ray lithography--Congresses; X-rays--Industrial applications--Congresses
言語:	英語

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