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Copper interconnects, new contact metallurgies, structures, and low-k interlevel dielectrics : proceedings of the internatioal symposium / editor, G.S. Mathad ; assistant editors, B.C. Baker ... [et al.] ; sponsoring divisions, Dielectric Science and Technology, Electronics, Electrodeposition

資料種別:
図書
出版情報:
Pennington, N.J. : Electrochemical Society, c2003
形態:
ix, 346 p. ; 24 cm
シリーズ名:
Proceedings / [Electrochemical Society] ; v. 2002-22 <BA01323290>
著者名:
International Symposium on Copper Interconnects, New Contact Metallurgies/Structures, and Low-k Interlevel Dielectrics
Mathad, G. S. <DA03249537>
Baker, B. C.
Electrochemical Society. Dielectric Science and Technology Division <DA06421624>
Electrochemical Society. Electronics Division <DA0357072X>
Electrochemical Society. Electrodeposition Division <DA06133470>
Electrochemical Society. Meeting <DA03398898>
さらに 2 件
ISBN:
9781566773799 [1566773792]
書誌ID:
BA62538202
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