Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA

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Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA / John L. Sturtevant, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering, AZ Electronic Materials (USA), Rohm and Haas Electronic Materials (USA) ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering.

資料種別:

図書

出版情報:

Bellingham, Wash. : SPIE, c2005

形態:

2 v. (xliii, 1216 p.) ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 5753 <BA0022700X>

著者名:

Advances in resist technology and processing

Sturtevant, John L.

Society of Photo-optical Instrumentation Engineers <DA00848546>

AZ Electronic Materials (USA)

Rohm & Haas Company <DA11382827>

International SEMATECH

さらに 1 件

ISBN:

9780819457332 [0819457337] (pt. 1)
9780819457332 [0819457337] (pt. 2)

書誌ID:

BA85951627

子書誌情報

フルテキスト

所蔵情報

他の版・巻

書誌詳細

注記:	Includes bibliographical references and author index
主題:	Microlithography--Congresses; Photoresists--Congresses
言語:	英語

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