Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
- 資料種別:
- 図書
- 出版情報:
- Bellingham, Wash., USA : SPIE, c1989
- 形態:
- viii, 388 p. ; 28 cm
- シリーズ名:
- Proceedings / SPIE -- the International Society for Optical Engineering ; v. 1089 <BA0022700X>
- 著者名:
- ISBN:
- 9780819401243 [0819401242]
- 書誌ID:
- BA12683130
類似資料:
SPIE--the International Society for Optical Engineering | |
S.P.I.E.-- International Society for Optical Engineering | |
SPIE--the International Society for Optical Engineering |