Polymers for high technology : electronics and photonics

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Polymers for high technology : electronics and photonics / Murrae J. Bowden, editor, S. Richard Turner, editor ; developed from a symposium sponsored by the Division of Polymeric Materials--Science and Engineering at the 192nd Meeting of the American Chemical Society, Anaheim, California, September 7-12, 1986

資料種別:

図書

出版情報:

Washington, DC : American Chemical Society, 1987

形態:

x, 628 p. ; 24 cm

シリーズ名:

ACS symposium series ; 346 <BA00073096>

著者名:

ISBN:

9780841214064 [0841214069]

書誌ID:

BA20921267

子書誌情報

フルテキスト

所蔵情報

他の版・巻

書誌詳細

注記:

Includes bibliographies and indexes

主題:

Microelectronics--Materials--Congresses; Microlithography--Materials--Congresses; Photoresists--Congresses; Polymers--Congresses

言語:

英語

目次情報:

Development of Radiation Chemistry Ionizing

Radiation on Condensed Systems

Radiation Effects in Polymers Main

Reactions of Chlorine- and Silicon-Containing Resists

Relations Between Photochemistry and Radiation Chemistry

Characteristics of a Two-layer Resist System

Phenolic Resin-Based Negative Resists

Electron-Beam Sensitivity of Acrylate Resists

A ""One-Layer"" Multilayer Resist

Silicon-Containing Electron-Beam Resist

Systems Lithographic Evaluation of Copolymers Acid-Catalyzed Thermo

Development of Radiation Chemistry Ionizing

Radiation on Condensed Systems

Radiation Effects in Polymers Main

Reactions of Chlorine- and Silicon-Containing Resists

Relations Between Photochemistry and Radiation Chemistry

Characteristics of a Two-layer Resist System

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