Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California

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Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California / Jim Dey, editor ; cooperating organization, Northern California Microphotomask/Masking Working Group

資料種別:

図書

出版情報:

Bellingham, Wash. : S.P.I.E.-- the Society of Photo-optical Instrumentation Engineers, c1979

形態:

vi, 194 p. ; 28 cm

シリーズ名:

Proceedings of the Society of Photo-Optical Instrumentation Engineers ; v. 174 <BA0118856X>

著者名:

ISBN:

9780892522026 [089252202X]

書誌ID:

BA23874276

子書誌情報

フルテキスト

所蔵情報

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書誌詳細

注記:	Proceedings of a seminar Includes bibliographical references and indexes
主題:	Microelectronics--Congresses; Microlithography--Congresses; Semiconductors--Congresses; Thin film circuits--Congresses
言語:	英語

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