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Developments in semiconductor microlithography, June 1-3, 1976, San Jose, California / Donald E. Routh ... [et al.], editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with National Aeronautics and Space Administration, International Society for Hybrid Microelectronics

資料種別:
図書
出版情報:
Palos Verdes Estates, Calif. : Society of Photo-optical Instrumentation Engineers, c1976
形態:
vi, 146 p. ; 28 cm
シリーズ名:
Proceedings of the Society of Photo-Optical Instrumentation Engineers ; v. 80 <BA0118856X>
著者名:
ISBN:
9780892521074 [0892521074]
書誌ID:
BA23913119
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