Polymeric materials for microelectronic applications : science and technology

>> Google Books

所蔵情報QRコード

Polymeric materials for microelectronic applications : science and technology / Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor

資料種別:

図書

出版情報:

Washington, DC : American Chemical Society, 1994

形態:

ix, 468 p. ; 24 cm

シリーズ名:

ACS symposium series ; 579 <BA00073096>

著者名:

ISBN:

9780841230552 [0841230552]

書誌ID:

BA24208702

子書誌情報

フルテキスト

所蔵情報

他の版・巻

書誌詳細

注記:

"Developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Divisionof Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 Meeting, Kawasaki, Japan, November 15-19, 1993"
Includes bibliographical references and indexes

著者名ヨミ:

タガワ, セイイチ
ホリエ, カズユキ

主題:

Microelectronics--Materials--Congresses; Polymers--Congresses

言語:

英語

目次情報:

Photophysics, Photochemistry, and Photo-optical Effects in Polymer Solids / K. Horie

Photochemistry of Liquid-Crystalline Polymers / D. Creed ; R. A. Coad ; A.C. Griffin ; C. E. Hoyle ; L. Jin ; P. Subramanian ; S. V. Varma ; K. Venkataram

Dissociative Electron Capture of Polymers with Bridging Acid Anhydrides: Matrix Isolation Electron Spin Resonance Study / P.H. Kasai

Luminescence Study of Ion-Irradiated Aromatic Polymers / Y.Aoki ; H. Namba ; F. Hosoi ; S. Nagai

New Directions in the Design of Chemically Amplified Resist / E.Reichmanis ; M.E. Galvin ; K. E. Uhrich ; P. Mirau ; S. A. Heffner:

Dual-Tone and Aqueous Base Developable Negative Resists Based on Acid-Catalyzed Dehydration / H.Ito ; Y. Maekawa

Importance of Donor-Acceptor Reactions for the Photogeneration of Acid in Chemically Amplified Resists / N.P. Hacker

Acid Generation in Chemivcally Amplified Resist Films / T.Watanabe ; Y. Yamashita ; T. Kozawa ; Y. Yoshida ; S. Tagawa

Radiation-Induced Reactions of Onium Salts in Novolak / M. Uesaka ; T. Watanabe ; Y.Yamashita ; H. Shibata

Polymeric Sulfonium Salts as Acid Generators for Excimer Laser Lithography / K. Maeda ; K. Nakano ; E. Hasegawa

Application of Triaryl Phosphate to Photosensitive Materials: Photoreaction Mechanisms of Triaryl Phosphate / I. Naito ; A. Kinoshita ; Y. Okamoto ; S. Takamuku

Effect of Water on the Surface Insoluble Layer of Chemical Amplified Positive Resists / J. Nakamura ; H. Ban ; Y. Kawai ; A. Tanaka

Thermal Properties of a Chemically Amplified Resist Resin / K. Asakawa ; A. Hongu ; N. Oyasato ; M. Nakase

Modeling and Simulation of Chemically Amplified Resist Systems / T. Ushirogouchi ; H. Wakabayashi ; S. Saito

Surface Imaging Using Photoinduced Acid-Catalyzed Formation of Polysiloxanes at Air-Polymer Interface / M. Shirai ; T. Sumino ; M. Tsunooka

Surface Imaging for Applications to Sub-0.35-mm Lithography / K.-H. Baik ; L. Van den hove

Molecular Design of Epoxy Resins for Microelectronics Packaging / M. Kaji

Uniaxial and In-Plane Molecular Orientation of Polymides and Their Precursor: Studied by Absorption Dichroism of Perylenebisimide Dye / M. Hasegawa ; T. Matan ; Y. Shindo ; T. Sugimura

Novel Photosensitive Polyimide Precursor Based on Polyisoimide Using Nifedipine as A Dissolution Inhibitor / A. Mochizuki ; T. Teraniishi ; M. Ueda ; T. Omote

Photochemical Behavior of Nifedipine Derivatives and Application to Photosensitsive Polyimides / T. Yamaoka ; S. Yokoyama ; K. Naitoh ; K. Yoshida

Waveguiding in High-Temperature-Stable Materials / C. Feger ; S. Perutz ; R. Reuter ; J.E. McGrath ; M. Osterfeld ; H. Franke

Rodlike Fluorinated Polyimide as in In-Plane Birefringent Optical Material / S. Ando ; T. Sawada ; Y. Inoue

Preparation of Polyphenylene and Copolymer for Microelectronics Applications / N.A. Johnen ; H.K. Kim ; C. K. Ober

Charge-Carrier Generation and Migration in a Polydiacetylene compound: Pulse Radiolysis, Time-Resolved Microwave Conductivity Study / G.P. van der Laan ; M.P. de Haas ; J.M. Warman ; D.M. de Leeuw ; J. Tsibouklis

Excitation Dynamics in Conjugated Polymers / H.ssler ; E.O. Gbel ; A. Greiner ; R. Kersting ; H. Kurz ; U. Lemmer ; R.F. Mahrt ; Y. Wada

Application of Polyaniline Films to Radiation Dosimetry / Y. Oki ; T. Suzuki ; T. Miura ; M. Numajiri ; K. Kondo

Present and Future of Fullerenes: C60 nd Tubules / K. Tanigaki

Photoresponsive Liquid-Crystalline Polymers: Holographic Storage, Digital Storage, and Holographic Optical Components / K. Anderle ; J. H. Wendorff

Azimuthal Alighment Photocontrol of Piquid Crystals / K. Ichimura

Electronic Structure and UV Absorption Spectra of Permethylated Silicon Chains / H.S. Plitt ; J.W. Downing ; H. Teramae ; M.K. Raymond ; J. Michl

Electronic Properties of Polysilanes / K. Seki ; A.Yuyama ; S. Narioka ; H. Ishii ; S. Hasegawa ; H. Isaka ; M. Fujino ; M. Fujiki ; N. Matsumoto ; R. G. Kepler ; Z.G Soos

UV Photoelectron Spectroscopy of Polysilanes and Polygermanes / A. Watanabe ; M. Matsuda ; Y. Yosh

Photophysics, Photochemistry, and Photo-optical Effects in Polymer Solids / K. Horie

Photochemistry of Liquid-Crystalline Polymers / D. Creed ; R. A. Coad ; A.C. Griffin ; C. E. Hoyle ; L. Jin ; P. Subramanian ; S. V. Varma ; K. Venkataram

Dissociative Electron Capture of Polymers with Bridging Acid Anhydrides: Matrix Isolation Electron Spin Resonance Study / P.H. Kasai

Luminescence Study of Ion-Irradiated Aromatic Polymers / Y.Aoki ; H. Namba ; F. Hosoi ; S. Nagai

New Directions in the Design of Chemically Amplified Resist / E.Reichmanis ; M.E. Galvin ; K. E. Uhrich ; P. Mirau ; S. A. Heffner:

Dual-Tone and Aqueous Base Developable Negative Resists Based on Acid-Catalyzed Dehydration / H.Ito ; Y. Maekawa

続きを見る

東工大ブックレビュー

類似資料:

1 図書 Polymers for microelectronics : resists and dielectrics American Chemical Society. Meeting, Thompson, L. F., 1944-, Willson, C. G. (C. Grant), 1939-, 田川, 精一, American … American Chemical Society	7 図書 Biosensors and chemical sensors : optimizing performance through polymeric materials Edelman, Peter G., 1956-, Wang, Joseph, 1948-, American Chemical Society. Division of Polymeric Materials : Science and … American Chemical Society
2 図書 Polymers for microelectronics and nanoelectronics Lin, Qinghuang, Pearson, R. A., 1958-, Hedrick, Jeffrey C., American Chemical Society. Division of Polymeric Materials : … American Chemical Society	8 図書 Mission and Challenges of Polymer Science and Technology (IUPAC PC2002) : Invited lectures from the IUPAC Polymer Conference : held in Kyoto, Japan, December 2 … IUPAC Polymer Conference (IUPAC PC), 堀江, 一之(1941-), International Union of Pure and Applied Chemistry. … Wiley-VCH-Verl
3 図書 Materials science of high temperature polymers for microelectronics : symposium held April 29-May 2, 1991, Anaheim, California, U.S.A. Grubb, David T., 1945-, 三田, 達(1929-), Yoon, D. Y. Materials Research Society	9 図書 Materials for microlithography : radiation-sensitive polymers Thompson, L. F., 1944-, Willson, C. G. (C. Grant), 1939-, Fréchet, J. M. J., American Chemical Society. Division of … The Society
4 図書 Polymers for high technology : electronics and photonics Bowden, M. J., 1943-, Turner, S. Richard, 1942-, American Chemical Society. Division of Polymeric Materials : Science … American Chemical Society, 1987	10 図書 Polymer membranes for gas and vapor separation : chemistry and materials science Freeman, B. D. (Benny D.), Pinnau, I. (Ingo), American Chemical Society. Division of Polymeric Materials : Science and … American Chemical Society
5 図書 Microelectronics technology : polymers in advanced imaging and packaging : developed from a symposium sponsored by the ACS Division of Polymeric Materials: … Reichmanis, Elsa, 1953-, American Chemical Society. Division of Polymeric Materials : Science and Engineering, … American Chemical Society	11 図書 Introduction of macromolecular science/polymeric materials into the foundational course in organic chemistry Howell, B. A. (Bobby Avery), 1942-, American Chemical Society. Division of Chemical Education American Chemical Society, Distributed in print by Oxford University Press
6 図書 Microelectronics processing : inorganic materials characterization Casper, Lawrence A., American Chemical Society. Division of Industrial and Engineering Chemistry American Chemical Society	12 図書 Step-growth polymers for high-performance materials : new synthetic methods : developed from a symposium sponsored by the Division of Polymer Chemistry, Inc., … Hedrick, James L., 1959-, Labadie, Jeff W., 1955-, American Chemical Society. Division of Polymer Chemistry, American … American Chemical Society