Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California | 東京科学大学図書館　蔵書検索（大岡山図書館、すずかけ台図書館）

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Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California / James Bondur, Alan R. Reinberg, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering

資料種別:

図書

出版情報:

Bellingham, Wash., USA : The Society, c1990

形態:

vii, 307 p. ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 1185 <BA0022700X>

著者名:

ISBN:

9780819402219 [0819402214]

書誌ID:

BA24466399

子書誌情報

フルテキスト

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書誌詳細

注記:	Includes bibliographical references and index
主題:	Ion beam lithography--Congresses; Lithography, Electron beam--Congresses; Plasma etching--Congresses; Semiconductors--Etching--Congresses
言語:	英語

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