Rapid isothermal processing : 12-13 October 1989, Santa Clara, California | 東京工業大学附属図書館蔵書検索

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Rapid isothermal processing : 12-13 October 1989, Santa Clara, California / Rajendra Singh, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison, SEMATECH

資料種別:

図書

出版情報:

Bellingham, Wash., USA : SPIE, c1990

形態:

vi, 204 p. ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 1189 <BA0022700X>

著者名:

ISBN:

9780819402257 [0819402257]

書誌ID:

BA24466763

子書誌情報

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書誌詳細

注記:	Includes bibliographical references and index
主題:	Semiconductor doping--Congresses; Semiconductors--Heat treatment--Congresses; Vapor plating--Congresses
言語:	英語

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