11th Annual Symposium on Photomask Technology : September 25-27, 1991, Sunnyvale, California | 東京工業大学附属図書館蔵書検索

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11th Annual Symposium on Photomask Technology : September 25-27, 1991, Sunnyvale, California / sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology

資料種別:

図書

出版情報:

Bellingham, Wash. : SPIE, c1992

形態:

vii, 348 p. ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 1604 <BA0022700X>

著者名:

ISBN:

9780819407337 [081940733X]

書誌ID:

BA26322083

子書誌情報

フルテキスト

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他の版・巻

書誌詳細

その他の標題:	Eleventh Annual Symposium on Photomask Technology
注記:	Includes bibliographical references and index
主題:	Integrated circuits--Masks--Congresses; Microlithography--Congresses
言語:	英語

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