Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California | 東京工業大学附属図書館蔵書検索

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Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

資料種別:

図書

出版情報:

Bellingham, Wash., USA : SPIE, c1990

形態:

viii, 344 p. ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 1263 <BA0022700X>

著者名:

ISBN:

9780819403100 [0819403105]

書誌ID:

BA26792870

子書誌情報

フルテキスト

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書誌詳細

注記:	Proceedings of the SPIE Symposium on Microlithography Includes bibliographical references
言語:	英語

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