Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
- 資料種別:
- 図書
- 出版情報:
- Bellingham, Wash., USA : SPIE, c1990
- 形態:
- viii, 344 p. ; 28 cm
- シリーズ名:
- Proceedings / SPIE -- the International Society for Optical Engineering ; v. 1263 <BA0022700X>
- 著者名:
- ISBN:
- 9780819403100 [0819403105]
- 書誌ID:
- BA26792870
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