Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering
- 資料種別:
- 図書
- 出版情報:
- Bellingham, Wash. : The Society, c1993
- 形態:
- vii, 470 p. ; 28 cm
- シリーズ名:
- Proceedings / SPIE -- the International Society for Optical Engineering ; v. 1924 <BA0022700X>
- 著者名:
- ISBN:
- 9780819411587 [0819411582] (pbk.)
- 書誌ID:
- BA27103981
類似資料:
SPIE--the International Society for Optical Engineering | |
S.P.I.E.-- International Society for Optical Engineering | |
SPIE--the International Society for Optical Engineering | |