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Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering

資料種別:
図書
出版情報:
Bellingham, Wash. : The Society, c1993
形態:
vii, 470 p. ; 28 cm
シリーズ名:
Proceedings / SPIE -- the International Society for Optical Engineering ; v. 1924 <BA0022700X>
著者名:
ISBN:
9780819411587 [0819411582] (pbk.)
書誌ID:
BA27103981
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