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Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes / editors, G.S. Mathad, M. Meyyappan, M. Engelhardt ; Dielectric Science & Technology, Electronics, and Electrodeposition Divisions

資料種別:

図書

出版情報:

Pennington, NJ : Electrochemical Society, c1998

形態:

ix, 370 p. ; 23 cm

シリーズ名:

Proceedings / [Electrochemical Society] ; v. 97-30 <BA01323290>

著者名:

International Symposium on Thin Film Materials, Processes, Reliability, and Applications: Thin Film Processes

Mathad, G. S. <DA03249537>

Engelhardt, M. (Michael)

Electrochemical Society. Dielectric Science and Technology Division <DA06421624>

Electrochemical Society. Electronics Division <DA0357072X>

Electrochemical Society. Electrodeposition Division <DA06133470>

Electrochemical Society. Meeting <DA03398898>

International Society of Electrochemistry. Meeting <DA12237583>

さらに 4 件

ISBN:

9781566771832 [1566771838]

書誌ID:

BA43162777

子書誌情報

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書誌詳細

その他の標題:	Thin film materials, processes, reliability, and applications: thin film processes
注記:	"Held as a part of the Joint International Meeting of the Electrochemical Society, Inc. and the International Society for Electrochemistry in Paris, France, Aug. 31-Sept. 5, 1997"--P. iii Includes bibliographical references and indexes
主題:	Plasma etching--Congresses; Thin film devices--Design and construction--Congresses; Thin films--Congresses
言語:	英語

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