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Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A. / editors, H.R. Huff ... [et al.]

資料種別:
図書
出版情報:
Warrendale, PA : Materials Research Society, 1999
形態:
xvii, 615 p. ; 24 cm
シリーズ名:
Materials Research Society symposium proceedings ; v. 567 <BA00013775>
著者名:
Huff, Howard R. <DA1224203X>  
ISBN:
9781558994744 [1558994742]
書誌ID:
BA43280580
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