1998 3rd International Symposium on Plasma Process-Induced Damage, June 4-5, 1998, Honolulu, Hawaii, USA

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1998 3rd International Symposium on Plasma Process-Induced Damage, June 4-5, 1998, Honolulu, Hawaii, USA / editors, Moritaka Nakamura, Thuy Dao, and Terence Hook ; technical co-sponsors, American Vacuum Society, IEEE/Electron Devices Society, Japan Society of Applied Physics

資料種別:

図書

出版情報:

Sunnyvale, CA : Northern California Chapter of the American Vacuum Society, c1998

形態:

234 p. ; 28 cm

著者名:

International Symposium on Plasma Process-Induced Damage

Nakamura, Moritaka

Dao, Leanne Thuy Lien, 1953-

Hook, Terence

IEEE Electron Devices Society <DA01257512>

American Vacuum Society <DA03926125>

応用物理学会 <DA00633233>

さらに 2 件

ISBN:

9780965157728 [0965157725] (:softbound)
9780780342668 [0780342666] (:microfiche)

書誌ID:

BA46666686

子書誌情報

フルテキスト

所蔵情報

他の版・巻

書誌詳細

注記:	"P[2]ID"--Cover "Plasma process-induced damage"--Cover "IEEE Catalog Number 98EX100"--Verso of t.p Includes bibliographical references and author index
著者名ヨミ:	オウヨウブツリガッカイ
主題:	Plasma etching--Congresses; Semiconductor wafers--Defects--Congresses; Semiconductors--Effect of radiation on--Congresses
言語:	英語

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