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1999 4th International Symposium on Plasma Process-Induced Damage, May 9-11, 1999, Monterey, California, USA / editors, Thuy Dao, Mitsumasa Koyanagi, Terence Hook ; technical co-sponsors,IEEE/Electron Devices Society, American Vacuum Society, Japan Society of Applied Physics

資料種別:
図書
出版情報:
Sunnyvale, CA : the American Vacuum Society, c1999
形態:
211 p. ; 28 cm
著者名:
International Symposium on Plasma Process-Induced Damage
Koyanagi Mitsumasa
Dao, Leanne Thuy Lien, 1953-
Hook, Terence
IEEE Electron Devices Society <DA01257512>
American Vacuum Society <DA03926125>
応用物理学会 <DA00633233>
さらに 2 件
ISBN:
9780965157735 [0965157733] (:softbound)
書誌ID:
BA50938382
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