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Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium / editor, G.S. Mathad ; assistant editors, D.W. Hess ... [et al.]

資料種別:
図書
出版情報:
Pennington, NJ : Electrochemical Society, c2000
形態:
x, 378 p. ; 24 cm
シリーズ名:
Proceedings / [Electrochemical Society] ; v. 99-30 <BA01323290>
著者名:
ISBN:
9781566772532 [1566772532]
書誌ID:
BA53255819
子書誌情報
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