Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium | 東京工業大学附属図書館蔵書検索

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Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium / editor, G.S. Mathad ; assistant editors, D.W. Hess ... [et al.]

資料種別:

図書

出版情報:

Pennington, NJ : Electrochemical Society, c2000

形態:

x, 378 p. ; 24 cm

シリーズ名:

Proceedings / [Electrochemical Society] ; v. 99-30 <BA01323290>

著者名:

ISBN:

9781566772532 [1566772532]

書誌ID:

BA53255819

子書誌情報

フルテキスト

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所蔵情報

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書誌詳細

注記:	Includes bibliographical references and indexes
言語:	英語

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