Thin film materials, processes, and reliability : proceedings of the international symposium | 東京科学大学図書館　蔵書検索（大岡山図書館、すずかけ台図書館）

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Thin film materials, processes, and reliability : proceedings of the international symposium / editor, G.S. Mathad ; assistant editors, M. Engelhardt ...[et al.]

資料種別:

図書

出版情報:

Pennington, N.J. : Electrochemical Society, c2001

形態:

viii, 216 p. ; 24 cm

シリーズ名:

Proceedings / [Electrochemical Society] ; v. 2001-24 <BA01323290>

著者名:

Mathad, G. S. <DA03249537>

Engelhardt, M. (Michael)

Electrochemical Society. Dielectric Science and Technology Division <DA06421624>

Electrochemical Society. Electronics Division <DA0357072X>

Electrochemical Society. Electrodeposition Division <DA06133470>

Electrochemical Society. Meeting <DA03398898>

International Society of Electrochemistry. Meeting <DA12237583>

さらに 2 件

ISBN:

9781566773577 [1566773571]

書誌ID:

BA59009269

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書誌詳細

注記:	"These symposia, jointly sponsored by Dielectric Science & Technology, Electronics, and Electrodeposition dicisions, were held as part of the 2001 Joint International Meeting -the 200th Meeting of The Electrochemical Society, Inc. and the 52nd Annual Meeting of the International Society of Electrochemistry, in San Francisco, CA, September 2-7, 2001" --on pref Includes bibliographical references and indexes
主題:	Plasma etching--Congresses; Thin film devices--Design and construction--Congresses; Thin films--Congresses
言語:	英語

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