Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK | 東京工業大学附属図書館蔵書検索

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Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK / Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK)

資料種別:

図書

出版情報:

Bellingham, Wash. : SPIE, c2001

形態:

vii, 422 p. ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 4404 <BA0022700X>

著者名:

Society of Photo-optical Instrumentation Engineers <DA00848546>

Scottish Enterprise <DA13456695>

European Optical Society <DA09002606>

Institution of Electrical Engineers <DA00900952>

さらに 1 件

ISBN:

9780819441058 [0819441058]

書誌ID:

BA61058008

子書誌情報

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書誌詳細

注記:	Includes bibliographic references and author index
主題:	Integrated circuits--Very large scale integration--Congresses; Lithography--Congresses; Printed circuits--Congresses
言語:	英語

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