| Preface |
| Materials Research Society Symposium Proceedings |
| Amorphous Network Structures, Electronic Metastability, Defects and Photoluminescence |
| Numerical Studies of the Dynamics of Silicon: Relaxation, Nucleation and Energy Landscape / Normand Mousseau ; Philippe Beaucage ; Francis Valiquette |
| Atomistic Character of Nanocrystalline and Mixed Phase Silicon / R. Biswas ; B.C. Pan |
| Kinetics of Light-Induced Effects in Mixed-Phase Hydrogenated Silicon Solar Cells / Guozhen Yue ; Baojie Yan ; Jeffrey Yang ; Kenneth Lord ; Subhendu Guha |
| Temperature Dependence of a Hydrogen Doublet Site in Light-Soaked a-Si:H From [superscript 1]H NMR / T. Su ; P.C. Taylor ; G. Ganguly ; D.E. Carlson |
| Evidence for Trap-Conversion Induced Instability in Amorphous Silicon / Vikram L. Dalal ; Puneet Sharma ; Abdul Aziz |
| Evolution of Charged Gap States in a-Si:H Under Light Exposure / M. Zeman ; V. Nadazdy ; R.A.C.M.M. van Swaaij ; R. Durny ; J.W. Metselaar |
| Metamict Transformation of Silica / Ju-Yin Cheng ; M.M.J. Treacy ; P.J. Keblinski |
| Metastable Defects in the Amorphous Silicon-Germanium Alloys / J. David Cohen |
| Temperature Dependence of the Decay of Optically Excited Charge Carriers in Amorphous Silicon / J. Whitaker |
| Electron-Spin-Resonance Investigation of Laser Crystallized Polycrystalline Silicon / K. Brendel ; N.H. Nickel ; K. Lips ; W. Fuhs |
| Time-Resolved Switching Studies in a-Si:H and Related Films / P. Stradins ; W.B. Jackson ; H.M. Branz ; J. Hu ; C.L. Perkins ; Qi Wang |
| Adsorption and Oxidation Effects in Microcrystalline Silicon / T. Dylla ; F. Finger ; R. Carius |
| Silicon Nanostructured Films Formed by Pulsed-Laser Deposition in Inert Gas and Reactive Gas / X.Y. Chen ; Y.F. Lu ; Y.H. Wu ; B.J. Cho ; H. Hu |
| Origin of the Low-Energy Photoluminescence in Microcrystalline Silicon Films / Joon-Yong Lee ; Dong-Hyun Park ; Jong-Hwan Yoon |
| Post-Transit Analysis of Transient Photocurrents From High-Deposition-Rate a-Si:H Samples / Monica Brinza ; W.M.M. Kessel ; Arno H.M. Smets ; M.C.M. van de Sanden ; Guy J. Adriaenssens |
| Size Distribution of Embedded Nano-Crystallites in Polymorphous Silicon Studied by Raman Spectroscopy and Photoluminescence / V. Tripathi ; Y.N. Mohapatra ; Md.N. Islam ; V. Suendo ; P. Roca i Cabarrocas |
| Thin Film Cavity Ringdown Spectroscopy and Second Harmonic Generation on Thin a-Si:H Films / I.M.P. Aarts ; B. Hoex ; J.J.H. Gielis ; C.M. Leewis ; A.H.M. Smets ; R. Engeln ; M. Nesladek ; W.M.M. Kessels |
| High Frequency Electron Spin Resonance Study of Hydrogenated Microcrystalline Silicon / Takashi Ehara |
| Photoelectron Spectroscopic Investigations of Very Thin a-Si:H Layers / M. Schmidt ; A. Schoepke ; O. Milch ; Th. Lussky |
| Determination of Defect Densities by Constant Photocurrent Method--Comparison of AC and DC Methods / Charlie Main ; Steve Reynolds ; Ivica Zrinscak ; Amar Merazga |
| Depth Profiling of Light-Induced Defects in Hydrogenated Amorphous Silicon by Transient Photocurrent Spectroscopy / Rudi Bruggemann |
| A Study of Electronic Defects in Hydrogenated Amorphous Silicon Prepared by the Expanding Thermal Plasma Technique / Zdravka Aneva ; Diana Nesheva |
| Thin Film Transistors and Imager Arrays |
| Performance of Thin-Film Silicon MEMS Resonators in Vacuum / J. Gaspar ; V. Chu ; J.P. Conde |
| Area-Dependent Switching in Thin-Film Silicon Devices / Jian Hu ; Warren Jackson ; Scott Ward ; Pauls Stradins ; Howard M. Branz |
| Properties of Silicon Nitride Films Prepared by Combination of Catalytic-Nitridation and Catalytic-CVD / A. Izumi ; A. Kikkawa ; K. Higashimine ; H. Matsumura |
| High-Rate ([greater than sign] 1nm/s) and Low-Temperature ([less than sign] 400[degree]C) Deposition of Silicon Nitride Using an N[subscript 2]/SiH[subscript 4] and NH[subscript 3]/SiH[subscript 4] Expanding Thermal Plasma / J. Hong |
| Switch-On Transients and Static Characteristics of Polymorphous and Amorphous Silicon Thin-Film Transistor |
| Dependences of Structural Parameters on the Characteristics of Poly-Si Thin-Film Transistors After Plasma Passivation / Cheng-Ming Yu ; Tiao-Yuan Huang ; Tan-Fu Lei ; Horng-Chih Lin |
| Above-Threshold Parameter Extraction Including Contact Resistance Effects for a-Si:H TFTs on Glass and Plastic / Peyman Servati ; Denis Striakhilev ; Arokia Nathan |
| Mechanical Stress and Process Integration of Direct X-ray Detector and TFT in a-Si:H Technology / Czang-Ho Lee ; Isaac Chan |
| Stacked n-i-p-n-i-p Heterojunctions for Image Recognition / M. Vieira ; A. Fantoni ; M. Fernandes ; P. Louro ; I. Rodrigues |
| Development of Vertically Integrated Imaging and Particle Sensors / N. Wyrsch ; C. Miazza ; S. Dunand ; A. Shah ; N. Blanc ; R. Kaufmann ; L. Cavalier ; G. Anelli ; M. Despeisse ; P. Jarron ; D. Moraes ; A.G. Sirvent ; G. Dissertori ; G. Viertel |
| An Amorphous Silicon Photoconductor for UV Detection / Matthias Hillebrand ; Frank Blecher ; Jurgen Sterzel ; Markus Bohm |
| Correlation Between the Tunneling Oxide and I-V Curves of MIS Photodiodes / H. Aguas ; L. Pereira ; A. Goullet ; R. Silva ; E. Fortunato ; R. Martins |
| Numerical Simulation of the Influence of the Gap State of a-Si:H on the Characteristics of a-Si:H p-i-n/OLED Coupling Device / Chunya Wu ; Yousu Chen ; Juan Li ; Guanghua Yang ; Huidong Yang ; Zhenhua Zhou ; Ying Zhao ; Zhiguo Meng ; Xinhua Geng ; Shaozheng Xiong ; Lizhu Zhang |
| Low-Temperature Growth of Poly-Si and SiGe Thin Films by Reactive Thermal CVD and Fabrication of High Mobility TFTs Over 50 cm[superscript 2]/Vs / Jun-ichi Hanna ; Kousaku Shimizu |
| Improvement of Gate Oxide Integrity in Low Temperature Poly Silicon TFT / Seok-Woo Lee ; Dae Hyun Nam ; Jin Mo Yoon ; Hyun Sik Seo ; Kyoung Moon Lim ; Chang-Dong Kim |
| Threshold Voltage Performance of a-Si:H TFTs for Analog Applications / K.S. Karim ; K. Sakariya ; A. Nathan |
| Characteristics of Bottom Gate Thin Film Transistors With Silicon Rich Poly-Si[subscript 1-x]Ge[subscript x] and Poly-Si Fabricated by Reactive Thermal Chemical Vapor Deposition / Jian Jun Zhang ; Jeong-Woo Lee |
| Optoelectronic Detection of DNA Molecules Using an Amorphous Silicon Photodetector / F. Fixe ; D.M.F. Prazeres |
| Fabrication of Novel TFT LCD Panels With High Aperture Ratio Using a-SiCO:H Films as a Passivation Layer / W.S. Hong ; K.W. Jung ; B.K. Hwang ; G. Cerny ; S.H. Yang ; J.H. Choi ; K. Chung |
| Leakage Current Behavior In Common i-Layer a-Si:H p-i-n Photodiode Arrays / Jeremy A. Theil |
| Enhanced Blue Sensitivity in ITO/a-SiN[subscript x]:H/a-Si:H MIS Photodetectors / S. Tao ; Y. Vygranenko |
| Solar Cells |
| Amorphous and Microcrystalline Silicon Based Solar Cells and Modules on Textured Zinc Oxide Coated Glass Substrates / Bernd Rech ; Joachim Muller ; Tobias Repmann ; Oliver Kluth ; Tobias Roschek ; Jurgen Hupkes ; Helmut Stiebig ; Wolfgang Appenzeller |
| Bandtail Limits to Solar Conversion Efficiencies in Amorphous Silicon Solar Cells / K. Zhu ; J. Yang ; W. Wang ; E.A. Schiff ; J. Liang ; S. Guha |
| Carrier Transport and Recombination in a-Si:H p-i-n Solar Cells in Dark and Under Illumination / J. Deng ; J.M. Pearce ; V. Vlahos ; R.J. Koval ; R.W. Collins ; C.R. Wronski |
| Hydrogenated Microcrystalline Silicon Single-Junction and Multi-Junction Solar Cells / Arindam Banerjee |
| Electronic Properties of Microcrystalline Silicon Investigated by Photoluminescence Spectroscopy on Films and Devices / T. Merdzhanova |
| Localized States in Microcrystalline Silicon Photovoltaic Structures Studied by Post-Transit Time-of-Flight Spectroscopy / Vladimir Smirnov ; Reinhard Carius ; Friedhelm Finger |
| Femtosecond Far-Infrared Studies of Carrier Dynamics in Hydrogenated Amorphous Silicon and Silicon-Germanium Alloys / A.V.V. Nampoothiri ; B.P. Nelson ; S.L. Dexheimer |
| Micro-Raman Studies of Mixed-Phase Hydrogenated Silicon Solar Cells / Jessica M. Owens ; Daxing Han |
| Hole Drift-Mobility Measurements in Contemporary Amorphous Silicon / S. Dinca ; Z. Lu ; Q. Yuan |
| Recombination in n-i-p (Substrate) a-Si:H Solar Cells With Silicon Carbide and Protocrystalline p-Layers / G.M. Ferreira |
| Nanocrystalline Silicon (nc-Si) From Single Ion Beam Sputtering / Z.B. Zhou ; G.M. Hadi ; R.Q. Cui ; Z.M. Ding ; G. Li |
| Correlation of Material Properties and Open-Circuit Voltage of Amorphous Silicon Based Solar Cells |
| Simulations of Buffer Layers in a-Si:H Thin Film Solar Cells Deposited With an Expanding Thermal Plasma / A.M.H.N. Petit |
| Microcrystalline (Si,Ge):H Solar Cells / Jianhua Zhu |
| Investigation of the Causes and Variation of Leakage Currents in Amorphous Silicon p-i-n Diodes / Todd R. Johnson ; Gautam Ganguly ; George S. Wood ; David E. Carlson |
| Deposition of Device Quality [mu]c-Si Films and Solar Cells at High Rates by HWCVD in a W Filament Regime Where W/Si Formation is Minimal / E. Iwaniczko ; A.H. Mahan ; B. Yan ; L.N. Gedvilas ; D.L. Williamson |
| Room Temperature Recovery of Light Induced Changes in Amorphous Silicon Solar Cells / M.S. Bennett ; F. Willing ; R.R. Arya |
| Toward Understanding the Degradation Without Light Soaking in Hot-Wire a-Si:H Thin Films and Solar Cells / Keda Wang |
| Material Aspects of Reactively MF-Sputtered Zinc Oxide for TCO Application in Silicon Thin-Film Solar Cells / Hilde Siekmann ; Chitra Agashe ; Hans P. Bochem ; Matthias Wuttig |
| Growth Mechanisms, Hot Filament CVD and Microcrystalline Si:H Growth |
| Combinatorial Approach to Thin-Film Silicon Materials and Devices / Leandro R. Tessler ; Helio Moutinho ; Bobby To ; John Perkins ; Dave Ginley |
| Calculations of SiH[subscript 3] Diffusion and Growth Processes on a-Si:H Surfaces / P. Vigneron ; P.W. Peacock ; K. Xiong ; J. Robertson |
| The a-Si:H Growth Mechanism: Temperature Study of the SiH[subscript 3] Surface Reactivity and the Surface Silicon Hydride Composition During Film Growth / Y. Barrell ; P.J. van den Oever ; J.P.M. Hoefnagels |
| Effects of Excitation Frequency and H[subscript 2] Dilution on Cluster Generation in Silane High-Frequency Discharges / Masaharu Shiratani ; Kazunori Koga ; Atsushi Harikai ; Takanori Ogata ; Yukio Watanabe |
| Application of Deposition Phase Diagrams for the Optimization of a-Si:H-Based Materials and Solar Cells / A.S. Ferlauto ; Joohyun Koh ; Chi Chen ; M.M. Al-Jassim ; K.M. Jones |
| Influence of Filament and Substrate Temperatures on Structural and Optoelectronic Properties of Narrow Gap a-SiGe:H Alloys Deposited by Hot-Wire CVD / Yueqin Xu ; Brent P. Nelson ; Lynn M. Gedvilas ; Robert C. Reedy |
| On the Role of Surface Diffusion and Its Relation to the Hydrogen Incorporation During Hydrogenated Amorphous Silicon Growth |
| Effect of Temperature and Temperature Uniformity on Plasma and Device Stability |
| Hydrosilylation of Silicon Surfaces: Crystalline Versus Amorphous / Andrea Lehner ; Georg Steinhoff ; Martin S. Brandt ; Martin Eickhoff ; Martin Stutzmann |
| Present Status of Hot Wire Chemical Vapor Deposition Technology / R.E.I. Schropp |
| Properties of High Quality p-Type Micro-Crystalline-Si Prepared by Cat-CVD / Hideki Matsumura ; Kouichi Katouno ; Masaya Itoh ; Atsushi Masuda |
| Investigations on the Real-Time Monitoring of the Crystallinity of Hydrogenated Microcrystalline Silicon Films / Christoph Ross |
| Towards Microcrystalline Silicon n-i-p Solar Cells With 10% Conversion Efficiency / L. Feitknecht ; C. Droz ; J. Bailat ; X. Niquille ; J. Guillet |
| Hydrogenated Amorphous Silicon Thin Films With Nanocrystalline Silicon Inclusions / T.J. Belich ; S. Thompson ; C.R. Perrey ; U. Kortshagen ; C.B. Carter ; J. Kakalios |
| Microstructure and Optical Functions of Transparent Conductors and Their Impact on Collection in Amorphous Silicon Solar Cells / P.I. Rovira ; Ilsin An ; Joong Hwan Kwak ; Koeng Su Lim |
| Reaction Control in Amorphous Silicon Film Deposition by Hydrogen Chloride / Akihiro Takano ; Takehito Wada ; Shinji Fujikake ; Takashi Yoshida ; Tokio Ohto ; Eray S. Aydil |
| Material Structure of Microcrystalline Silicon Deposited With an Expanding Thermal Plasma / C. Smit |
| Microcrystalline Silicon Thin Film Growth by Electron Cyclotron Resonance Chemical Vapour Deposition at 80[degree]C for Plastic Application / Ian Y.Y. Bu ; A.J. Flewitt ; W.I. Milne |
| Evolution of Crystallinity in Mixed-Phase (a+[mu]c)-Si:H as Determined by Real Time Spectroscopic Ellipsometry |
| Structural Characterization of Microcrystalline Silicon Solar Cells Fabricated by Conventional RF-PECVD / Liwei Li ; Yuan-Min Li ; J.A. Anna Selvan ; Alan E. Delahoy ; Roland A. Levy |
| Hot-Wire Chemical Vapor Deposition for Epitaxial Silicon Growth on Large-Grained Polycrystalline Silicon Templates / M.S. Mason ; C.M. Chen ; H.A. Atwater |
| Film Growth Related to Devices |
| Helium Versus Hydrogen Dilution of Silane in the Deposition of Polymorphous Silicon Films: Effects on the Structure and the Transport Properties / O. Saadane ; S. Lebib ; A.V. Kharchenko ; C. Longeaud |
| Characterization of Nanocrystalline Silicon Film Grown by LEPECVD for Photovoltaic Applications / M. Bollani ; S. Binetti ; M. Acciarri ; L. Fumagalli ; A. Arcari ; S. Pizzini ; H. von Kanel |
| Influence of Substrate Temperature and Hydrogen Dilution Ratio on the Properties of Nanocrystalline Silicon Thin Films Grown by Hot-Wire Chemical Vapor Deposition / H.R. Moutinho ; C.-S. Jiang ; B. Nelson ; Y. Xu ; J. Perkins ; B. To ; M.J. Romero |
| Electrical Properties of Phosphorus-Doped and Boron-Doped Nanocrystalline Germanium Thin-Films for p-i-n Devices / William B. Jordan ; Sigurd Wagner |
| p- and n-Type Microcrystalline SiC Fabricated by rf Plasma CVD With Ethane Gas / T. Toyama ; Y. Nakano ; T. Kosuge ; A. Asano ; H. Okamoto |
| Polymorphous Silicon Films Produced in Large Area Reactors by PECVD at 27.12 MHz and 13.56 MHz / L. Raniero |
| Surface Roughness Study of Low-Temperature PECVD a-Si:H / George T. Dalakos ; Joel L. Plawsky ; Peter D. Persans |
| Hollow Electrode Enhanced RF Glow Plasma Generation and Its Application to the Fast Deposition of Microcrystalline Silicon Films / Toshihiro Tabuchi ; Masayuki Takashiri ; Yasumasa Toyoshima ; Hiroyuki Mizukami |
| The Reliability of Measurements on Electron Energy Distribution Function in Silane rf Glow Discharges / Kuixun Lin ; Xuanying Lin ; Linfei Chi ; Chuying Yu ; Yunpeng Yu ; Shi Liu |
| High Rate Deposition of Stable Hydrogenated Amorphous Silicon in Transition From Amorphous to Microcrystalline Silicon / Guofu Hou ; Xiaodan Zhang ; Junming Xue ; Huizhi Ren ; Jian Sun ; Dekun Zhang |
| Properties of Nanocrystalline Germanium-Carbon Films and Devices / X.J. Niu ; Max Noack |
| Structural Evolution of Nanocrystalline Germanium Thin Films With Film Thickness and Substrate Temperature / Eric D. Carlson |
| Process Parameters for Poly-Silicon Deposition at a High Growth Rate (1-7nm/s) by Hot-Wire Chemical Vapor Deposition / J.K. Rath ; A.J. Hardeman ; C.H.M. van der Werf ; P.A.T.T. van Veenendaal ; M.Y.S. Rusche |
| High Temperature n- and p-Type Doped Microcrystalline Silicon Layers Grown by VHF PECVD Layer-by-Layer Deposition / A. Gordijn |
| Influence of Hydrogen Dilution on Properties of Silicon Films Prepared by D.C. Saddle-Field Glow-Discharge: Observation of Microcrystallinity / T. Allen ; I. Milostnaya ; D. Yeghikyan ; K. Leong ; F. Gaspari ; N.P. Kherani ; T. Kosteski ; S. Zukotynski |
| Reactive Pulsed Laser Deposition of Microcrystalline Ge-Based Thin Films / Matthew R. Wills ; Ruth Shinar ; Alan P. Constant |
| Electrical and Optical Properties of Amorphous and Microcrystalline Hydrogenated Silicon Films Deposited Using Saddle-Field Glow-Discharge / W.L. Roes |
| Crystallized Films |
| Stress Effects on Nanocrystal Formation by Ni-Induced Crystallization of Amorphous Si / Yaocheng Liu ; Michael D. Deal ; Mahmooda Sultana ; James D. Plummer |
| Field-Assisted Germanium Induced Crystallization of Amorphous Silicon / J. Derakhshandeh ; S. Mohajerzadeh ; N. Golshani ; E. Asl Soleimani ; M.D. Robertson |
| Prediction of the Interface Response Functions for Amorphous and Crystalline Phases of Silicon and Germanium / Erik J. Albenze ; Laura A. Matejik ; Nick F. Fynan ; Paulette Clancy |
| Advanced Lateral Crystal Growth of a-Si Thin Films by Double-Pulsed Irradiation of All Solid-State Lasers / Toshio Kudo ; Koji Seike ; Kazunori Yamazaki ; Hirohito Komori ; Sachi Yawaka ; Shiro Hamada ; Cheng-Guo Jin |
| Influence of Laser Annealing on Hydrogen Bonding in Disordered Silicon Thin Films |
| Metal Containing Link Formed in Amorphous Silicon Metal-to-Metal Antifuse / Frank Hawley ; Farid Issaq ; Jeewika Ranaweera ; Roy Lambertson ; John McCollum |
| Direct Electrical Characterization of Metal Induced Lateral Crystallization Regions by Spreading Resistance Probe Measurements / Alexandre M. Myasnikov ; Vincent M.C. Poon ; Vincent T.C. Leung ; Mansun Chan ; Lawrence C.F. Cheng |
| Effect of SiO[subscript 2] Capping Layer on a Laser Crystallization of a-Si Thin Film / Myung-Koo Kang ; Hyun Jae Kim ; Sook Young Kang ; Su-Kyung Lee ; Chi-Woo Kim ; Kyuha Chung |
| Laser Interference Structuring of a-GeN for the Production of Optical Diffraction Gratings / M. Mulato ; A.R. Zanatta ; D. Toet ; I.E. Chambouleyron |
| Observation and Annealing of Incomplete Recrystallized Junction Defects Due to the Excimer Laser Beam Diffraction at the Gate Edge in Poly-Si TFT / Woo-Jin Nam ; Kee-Chan Park ; Sang-Hoon Jung ; Soo-Jeong Park ; Min-Koo Han |
| 2-Dimensional Controlled Large Lateral Grain Growth on the Floating Amorphous Silicon Film by Excimer Laser Recrystallization / In-Hyuk Song ; Su-Hyuk Kang |
| Improved Electrical Properties in Nanocrystalline Si Formed by Metal Induced Growth / Chunhai Ji ; Wayne A. Anderson |
| A Simple Lateral Grain Growth of Poly-Si by Single Excimer Laser Crystallization of Amorphous Silicon Film Deposited on Polygon Shaped Trench / Hee-Sun Shin |
| Formation of Large, Orientation-Controlled, Nearly Single Crystalline Si Thin Films on SiO[subscript 2] Using Contact Printing of Rolled and Annealed Nickel Tapes / Hwang Huh ; Jung H. Shin |
| Lifetime Measurements of Stain Etched and Passivated Porous Silicon / Ricardo Guerrero-Lemus ; Fathi A. Ben-Hander ; Cristoffer Ballif ; Ali Kenanoglu ; Dietmar Borchert ; Cecilio Hernandez-Rodriguez ; Tomas Rodriguez ; Jose M. Martinez-Duart |
| Anomalous Behavior of Stain Etched Porous Silicon Photoluminescence |
| Scattering Rings in Birefringent Porous Silicon / Claudio J. Oton ; Zeno Gaburro ; Mher Ghulinyan ; Nicola Daldosso ; Lucio Pancheri ; Paolo Bettotti ; Luca Dal Negro ; Lorenzo Pavesi |
| Light and Thermally Induced Metastabilities in Nanocrystalline Silicon / N.P. Mandal ; S.C. Agarwal |
| Physicochemical Characterization of Porous Silicon Surfaces Etched in Salt Solutions of Varying Compositions and pH / Mariem Rosario-Canales ; Ana R. Guadalupe ; Luis F. Fonseca ; Oscar Resto |
| Author Index |
| Subject Index |
| Preface |
| Materials Research Society Symposium Proceedings |
| Amorphous Network Structures, Electronic Metastability, Defects and Photoluminescence |
| Numerical Studies of the Dynamics of Silicon: Relaxation, Nucleation and Energy Landscape / Normand Mousseau ; Philippe Beaucage ; Francis Valiquette |
| Atomistic Character of Nanocrystalline and Mixed Phase Silicon / R. Biswas ; B.C. Pan |
| Kinetics of Light-Induced Effects in Mixed-Phase Hydrogenated Silicon Solar Cells / Guozhen Yue ; Baojie Yan ; Jeffrey Yang ; Kenneth Lord ; Subhendu Guha |
図書
Amorphous silicon technology, 1993 : Symposium held April 13-16, San Francisco, California, U.S.A.