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Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium / editor, G.S. Mathad ; assistant editors, T. S. Cale ...[et al.] ; sponsoring divisions, Dielectric Science and Technology, Electronics

資料種別:
図書
出版情報:
Pennington, N.J. : Electrochemical Society, c2003
形態:
x, 424 p. ; 24 cm
シリーズ名:
Proceedings / [Electrochemical Society] ; v. 2003-13 <BA01323290>
著者名:
ISBN:
9781566773935 [1566773938]
書誌ID:
BA6623218X
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