Flatness, roughness, and discrete defect characterization for computer disks, wafers, and flat panel displays : 8-9 August 1996, Denver, Colorado

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Flatness, roughness, and discrete defect characterization for computer disks, wafers, and flat panel displays : 8-9 August 1996, Denver, Colorado / John C. Stover, chair/editor

資料種別:

図書

出版情報:

Bellingham, Wash. : SPIE-The International Society for Optical Engineering, c1996

形態:

vii, 188 p. ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 2862 <BA0022700X>

著者名:

ISBN:

9780819422507 [0819422509]

書誌ID:

BA79658118

子書誌情報

フルテキスト

所蔵情報

他の版・巻

書誌詳細

注記:

Includes bibliographical references and index

主題:

Flatness measurement--Congresses; Semiconductor wafers--Measurement--Congresses; Surface roughness--Measurement--Congresses

言語:

英語

目次情報:

Silicon wafer specifications and characterization capabilities: another perspective / Randal K. Goodall

Proposed methodology for characterization of microroughness-induced optical scatter instrumentation / Thomas A. Germer ; Clara C. Asmail

Morphology of silicon wafer surfaces: a comparative study with atomic force microscopy and other techniques / Peter Wagner ; H. A. Gerber ; D. Graef ; R. Schmolke ; M. Suhren

Fast and accurate roughness characterization techniques for wafers and hard disks / Hendrik Rothe ; Andre Kasper

Method to improve the accuracy of super-smooth surface scatter data / Yoshitate Takakura ; Mohamed T. Sehili ; Patrick Meyrueis

Application of off-specular x-ray reflectivity for surface characterization / Wen-Li Wu

Surface haze in the Stokes-Mueller representation / Eugene L. Church ; John C. Stover

Requirements and suggestions for an industrial smooth surface microroughness standards

Development of a physical haze and microroughness standard / Bradley W. Scheer

Confocal microscope 3D visualizing method for fine surface characterization of microstructures / Yoshiharu Ichikawa ; Jun-Ichiro Toriwaki

Selection of calibration particles for scanning surface inspection systems / George W. Mulholland ; Nelson Bryner ; Walter Liggett

Utilization of near specular energy in the detection of surface defects / Kevin Welch

Comparison of experimentally measured differential scattering cross sections of PSL spheres on flat surfaces and patterned surfaces / Greg W. Starr ; Edwin Dan Hirleman

Modeling of light scattering from structures with particle contaminants / Brent M. Nebeker

Requirements of measurement equipment for silicon wafers / R. Velten

Large flat panel profiler / Klaus R. Freischlad

Flatness measurement by reflection moire technique / Hisatoshi Fujiwara ; Yukitoshi Otani ; Toru Yoshizawa

New method of surface characterization with a single-mode fiber to thin film coupler / Alok K. Das ; Amar K. Ganguly ; Anawar Hussain ; Shila Ghosh ; Bharat S. Choudhury

Instrument for measuring flatness by using laser and CCD / Qun Hao ; Mang Cao ; Dacheng Li

Silicon wafer specifications and characterization capabilities: another perspective / Randal K. Goodall

Proposed methodology for characterization of microroughness-induced optical scatter instrumentation / Thomas A. Germer ; Clara C. Asmail

Morphology of silicon wafer surfaces: a comparative study with atomic force microscopy and other techniques / Peter Wagner ; H. A. Gerber ; D. Graef ; R. Schmolke ; M. Suhren

Fast and accurate roughness characterization techniques for wafers and hard disks / Hendrik Rothe ; Andre Kasper

Method to improve the accuracy of super-smooth surface scatter data / Yoshitate Takakura ; Mohamed T. Sehili ; Patrick Meyrueis

Application of off-specular x-ray reflectivity for surface characterization / Wen-Li Wu

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