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Materials, processes, integration and reliability in advanced interconnects for micro- and nanoelectronics : symposium held April 10-12, 2007, San Francisco, California, U.S.A. / editors: Qinghuang Lin ... [et al.]

資料種別:
図書
出版情報:
Warrendale, Pa. : Materials Research Society, c2007
形態:
xiv, 338 p. ; 24 cm
シリーズ名:
Materials Research Society symposium proceedings ; v. 990 <BA00013775>
著者名:
ISBN:
9781558999503 [1558999507]
書誌ID:
BA83416338
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