所蔵情報QRコード
Proceedings of the third Symposium on Plasma Processing / edited by: J. Dieleman, R.G. Frieser, G. S. Mathad
- 資料種別:
- 図書
- 出版情報:
- Pennington, NJ : Electrochemical Society, c1982
- 形態:
- xi, 516 p. ; 23 cm
- シリーズ名:
- Proceedings / [Electrochemical Society] ; v. 82-6 <BA01323290>
- 著者名:
- 書誌ID:
- BA84886020
類似資料:
Electrochemical Society |
Electrochemical Society |
Electrochemical Society | |
Electrochemical Society |
the Electrochemical Society, Inc. |
the Electrochemical Society, Inc. |
10
図書
Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium
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the Electrochemical Society, Inc. |
Electrochemical Society |
Electrochemical Society |
Dielectric Science & Technology, and Electronics Divisions, Electrochemical Society |