所蔵情報QRコード
Proceedings of the fourth Symposium on Plasma Processing / edited by G.S. Mathad, G.C. Schwartz, G. Smolinsky ; [sponsored by] Dielectrics and Insulation and Electronics Divisions
- 資料種別:
- 図書
- 出版情報:
- Pennington, N.J. : Electrochemical Society, c1983
- 形態:
- x, 649 p. ; 23 cm
- シリーズ名:
- Proceedings / [Electrochemical Society] ; v. 83-10 <BA01323290>
- 著者名:
- 書誌ID:
- BA84902513
類似資料:
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
the Electrochemical Society, Inc. |
9
図書
Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium
Electrochemical Society | |
the Electrochemical Society, Inc. |
Electrochemical Society |
the Electrochemical Society, Inc. |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |