所蔵情報QRコード
Proceedings of the Sixth Symposium on Plasma Processing / edited by G.S. Mathad, G.C. Schwartz, R.A. Gottscho
- 資料種別:
- 図書
- 出版情報:
- Pennington, NJ : Electrochemical Society, c1987
- 形態:
- x, 754 p. ; 23 cm
- シリーズ名:
- Proceedings / [Electrochemical Society] ; v. 87-6 <BA01323290>
- 著者名:
- 書誌ID:
- BA84940691
類似資料:
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
the Electrochemical Society, Inc. |
10
図書
Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium
Electrochemical Society | |
the Electrochemical Society, Inc. |
Electrochemical Society |
the Electrochemical Society, Inc. |
Electrochemical Society |