Proceedings of the Second International Symposium on Silicon Molecular Beam Epitaxy | 東京工業大学附属図書館蔵書検索

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Proceedings of the Second International Symposium on Silicon Molecular Beam Epitaxy / edited by John C. Bean, Leo J. Schowalter ; assistant editors, Hiroshi Ishiwara, Erich Kasper, Evan H.C. Parker

資料種別:

図書

出版情報:

Pennington, NJ : Electrochemical Society, c1988

形態:

x, 619 p. ; 23 cm

シリーズ名:

Proceedings / [Electrochemical Society] ; v. 88-8 <BA01323290>

著者名:

International Symposium on Silicon Molecular Beam Epitaxy <DA00627412>

Electrochemical Society. Meeting <DA03398898>

Bean, John C. (John Condon), 1950- <DA00627423>

Schowalter, Leo J. <DA05219967>

Electrochemical Society. Electronics Division <DA0357072X>

Electrochemical Society. Dielectrics and Insulation Division <DA03570741>

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書誌ID:

BA84955371

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その他の標題:	Silicon molecular beam epitaxy II Silicon molecular beam epitaxy 2
注記:	Includes bibliographical references and index "... held on October 20-23, 1987 in Honolulu, Hawaii as a part of the 172nd Meeting of the Electrochemical Society" -- on pref Sponsored by: the Electronics and the Dielectrics and Insulation Divisions of the Electrochemical Society
主題:	Molecular beam epitaxy--Congresses; Silicon--Congresses
言語:	英語

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