Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA | 東京科学大学図書館　蔵書検索（大岡山図書館、すずかけ台図書館）

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Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA / Iraj Emami, chair/editor ; Christopher P. Ausschnitt, Kenneth W. Tobin, Jr., cochair/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering

資料種別:

図書

出版情報:

Bellingham, Wash. : SPIE, c2005

形態:

xxxiii, 260 p. ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 5755 <BA0022700X>

著者名:

Data Analysis and Modeling for Process Control (Conference)

Ausschnitt, Christopher P.

Tobin, Kenneth W.

Society of Photo-optical Instrumentation Engineers <DA00848546>

International SEMATECH

さらに 1 件

ISBN:

9780819457356 [0819457353]

書誌ID:

BA86005442

子書誌情報

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書誌詳細

注記:	Includes bibliographical references and author index
主題:	Intelligent control systems--Mathematical models--Congresses; Manufacturing processes--Automatic control--Congresses; Manufacturing processes--Mathematical models--Congresses; Process control--Mathematical models--Congresses
言語:	英語

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