Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA

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Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA / R. Scott Mackay, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH

資料種別:

図書

出版情報:

Bellingham, Wash. : SPIE, c2005

形態:

2 v. (xviii, 1244 p.) ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 5751 <BA0022700X>

著者名:

ISBN:

9780819457318 [0819457310] (pt. 1)
9780819457318 [0819457310] (pt. 2)

書誌ID:

BA86033459

子書誌情報

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書誌詳細

その他の標題:	Emerging lithographic technologies 9 Emerging lithographic technologies nine
注記:	Includes bibliographical references and author index
主題:	Lithography, Electron beam--Congresses; Masks (Electronics)--Congresses; Microlithography--Industrial applications--Congresses; X-ray lithography--Congresses; X-rays--Industrial applications--Congresses
言語:	英語

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