Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA / Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

資料種別:

図書

出版情報:

Bellingham, Washington : SPIE, c2001

形態:

2 v. (xxix, 1084 p.) ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 4345 <BA0022700X>

著者名:

• Houlihan, Francis M.
• Annual SPIE Cconference on Advances in Resist Ttechnology and Processing
• Society of Photo-optical Instrumentation Engineers <DA00848546>
• Semiconductor Equipment and Materials International <DA0468648X>
• International SEMATECH

ISBN:

9780819440310 [0819440310] (: set)

書誌ID:

BB29368259