Photomask and X-ray mask technology VI : 13-14 April 1999, Yokohama, Japan | 東京工業大学附属図書館蔵書検索

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Photomask and X-ray mask technology VI : 13-14 April 1999, Yokohama, Japan / Hiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Japan Society of Applied Physics ... [et al.]

資料種別:

図書

出版情報:

Bellingham, Wash. : SPIE, c1999

形態:

xiii, 628 p. ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 3748 <BA0022700X>

著者名:

Photomask and X-ray mask technology

Morimoto, Hiraoki

Photomask Japan

BACUS (Technical group) <DA08910530>

Society of Photo-optical Instrumentation Engineers <DA00848546>

応用物理学会 <DA00633233>

さらに 1 件

ISBN:

9780819432308 [081943230X] (: pbk)

書誌ID:

BB29549082

子書誌情報

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書誌詳細

注記:	Includes bibliographical references and author index
著者名ヨミ:	オウヨウブツリガッカイ
主題:	Integrated circuits--Masks--Congresses; Masks (Electronics)--Congresses; Microlithography--Congresses; Optoelectronic devices--Design and construction--Congresses; X-ray lithography--Congresses
言語:	英語

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