Metrology, inspection, and process control for microlithography XXI : 26 February-1 March 2007, San Jose, California, USA

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Metrology, inspection, and process control for microlithography XXI : 26 February-1 March 2007, San Jose, California, USA / Chas N. Archie, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH (USA)

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図書

出版情報:

Bellingham, Wash. : SPIE, c2007

形態:

1 v. (various pagings) ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 6518 <BA0022700X>

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書誌ID:

BC02140461

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Metrology, inspection, and process control for microlithography XXI : 26 February-1 March 2007, San Jose, California, USA (: pt. 1)
Chas N. Archie, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH (USA) , SPIE , c2007

Metrology, inspection, and process control for microlithography XXI : 26 February-1 March 2007, San Jose, California, USA (: pt. 2)
Chas N. Archie, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH (USA) , SPIE , c2007

書誌詳細

その他の標題:	Metrology, inspection, and process control for microlithography 21 Metrology, inspection, and process control for microlithography twenty-one
注記:	Includes bibliographical references and author index "Part Three of Three Parts"--T.p.
主題:	Integrated circuits--Inspection--Congresses; Integrated circuits--Measurement--Congresses; Microlithography--Congresses; Process control--Congresses
言語:	英語

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