Optical microlithography XX : 27 February-2 March 2007, San Jose, California, USA

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Optical microlithography XX : 27 February-2 March 2007, San Jose, California, USA / Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH Inc.

資料種別:

図書

出版情報:

Bellingham, Wash. : SPIE, c2007

形態:

1 v. (various pagings) ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 6520 <BA0022700X>

著者名:

書誌ID:

BC02331492

子書誌情報

フルテキスト

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他の版・巻

Optical microlithography XX : 27 February-2 March 2007, San Jose, California, USA (: pt. 2)
Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH Inc. , SPIE , c2007

Optical microlithography XX : 27 February-2 March 2007, San Jose, California, USA (: pt. 3)
Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH Inc. , SPIE , c2007

書誌詳細

その他の標題:	Optical microlithography 20 Optical microlithography twenty
注記:	Includes bibliographical references and author index "Part One of Three Parts"--T.p.
主題:	Integrated circuits--Masks--Congresses; Manufacturing processes--Congresses; Microlithography--Congresses; X-ray lithography--Congresses
言語:	英語

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