Photomask and next-generation lithography mask technology VIII : 25-27 April 2001, Yokohama, Japan | 東京工業大学附属図書館蔵書検索

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Photomask and next-generation lithography mask technology VIII : 25-27 April 2001, Yokohama, Japan / Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for symposium, the Japan Society of Applied Physics ... [et al.] ; supported by Yokohama City

資料種別:

図書

出版情報:

Bellingham, Wash. : SPIE, c2001

形態:

xv, 738 p. ; 28 cm

シリーズ名:

Proceedings / SPIE -- the International Society for Optical Engineering ; v. 4409 <BA0022700X>

著者名:

ISBN:

9780819441119 [0819441112]

書誌ID:

BC07734882

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書誌詳細

その他の標題:	Photomask and next-generation lithography mask technology 8 Photomask and next generation lithography mask technology
注記:	Some earlier proceedings have title: Photomask and X-ray mask technology Includes bibliographical references and index
著者名ヨミ:	オウヨウブツリガッカイ
主題:	Integrated circuits--Masks--Congresses; Masks (Electronics)--Congresses; Microlithography--Congresses; Optoelectronic devices--Design and construction--Congresses; X-ray lithography--Congresses
言語:	英語

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